BIS pulls eight Chinese entities from Unverified List

   The Commerce Department’s Bureau of Industry and Security recently has removed eight entities from its Unverified List (UVL) and corrected the name of one person currently on the list.
   “The eight [entities] are removed from the UVL on the basis that BIS was able to verify their bona fides because of an end-use check,” the agency said in a Federal Register notice.
   Removed from the UVL were:
   • Beijing Bayi Space LCD Materials Technology Co. Ltd., Beijing;
   • Hubei Flying Optical, Qianjiang, China;
   • Sunder Tools (Changxing) Technology, Huzhou, Zhejiang Province, China;
   • Wuhan Yifi Laser Equipment Co., Wuhan, China;
   • Wuxi Hengling Technology Co. Ltd., Jiangsu Province, Wuxi City, China;
   • Xiamen Sanan Optoelectronics, Xiamen, China;
   • Zhejiang Xizi Aviation, Zhejiang, China;
   • And Zolix Instruments Co., Beijing.
   The Federal Register notice noted a correction to one Chinese UVL listing: Beijing Institute of Nanoenergy and Technology. BIS was notified that the entity’s correct name is Beijing Institute of Nanoenergy and Nanosystems.
   The Unverified List, short for the List of Unverified Persons in Foreign Countries, was established by BIS in June 2002. Its purpose is to make exporters aware of the U.S. government’s concerns with certain foreign entities or individuals due to possible national security concerns, but whose overseas locations could not be definitively identified during BIS’s prelicense checks or post-shipment verifications.
   There are myriad reasons why end-use checks may be incomplete. For example, BIS may be unable to find the foreign party’s address indicated on the export documents and thus cannot contact the party by telephone or email for additional information. There may be cases in which BIS is prevented by foreign governments from performing thorough export end-use checks. 
   Under these circumstances, the lack of sufficient information precludes BIS from adding these foreign entities or individuals of concern to the more explicit Entity List, resulting in their placement on the UVL.